Semiconductor Wet Process Filtration Solutions

One of the biggest challenges in the semiconductor manufacturing industry is surface contamination of silicon wafers. Research has shown that defects caused by contamination can lead to electrical failures in chips, with a failure rate as high as 80%. If contaminants are not completely removed during wafer manufacturing, it can affect the yield of the wafers or even result in the scrapping of entire batches. Therefore, semiconductor cleaning processes are one of the most critical steps in semiconductor manufacturing. Wet processes, as an important part of semiconductor processes, involve etching and cleaning the wafer surface using chemicals (acids, bases, solvents, etc.) and ultra-pure water as the liquid medium.